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Graphene oxide monolayers as an atomically thin seeding layers for atomic layer deposition of metal oxides

dc.contributor.authorNourbakhsh, Amirhasan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSong, Yi
dc.contributor.authorLee, ChangSeung
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorBrizzi, Simone
dc.contributor.authorTallarida, Massimo
dc.contributor.authorSchmeisser, Dieter
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorKong, Jing
dc.contributor.authorPalacios, Tomas
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T21:24:48Z
dc.date.available2021-10-22T21:24:48Z
dc.date.issued2015
dc.identifier.issn2040-3364
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25696
dc.sourceIIOimport
dc.titleGraphene oxide monolayers as an atomically thin seeding layers for atomic layer deposition of metal oxides
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage10781
dc.source.endpage10789
dc.source.journalNanoscale
dc.source.volume7
dc.identifier.urlhttp://pubs.rsc.org/en/Content/ArticleLanding/2015/NR/c5nr01128k#!divAbstract
imec.availabilityPublished - imec


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