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Modification of PECVD and SOG ultralow-k films by CO2 plasma

dc.contributor.authorOlawumi, Teju Tunde
dc.contributor.authorLevrau, E.
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorDetavernier, C.
dc.contributor.authorBartha, J.W.
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T21:27:07Z
dc.date.available2021-10-22T21:27:07Z
dc.date.issued2015
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25702
dc.sourceIIOimport
dc.titleModification of PECVD and SOG ultralow-k films by CO2 plasma
dc.typeJournal article
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageN3048
dc.source.endpageN3057
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue1
dc.source.volume4
dc.identifier.urlhttp://jss.ecsdl.org/content/4/1/N3048.abstract
imec.availabilityPublished - open access


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