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dc.contributor.authorRecaman Payo, Maria
dc.contributor.authorKuzma Filipek, Izabela
dc.contributor.authorDuerinckx, Filip
dc.contributor.authorLi, Yuandong
dc.contributor.authorCornagliotti, Emanuele
dc.contributor.authorUruena De Castro, Angel
dc.contributor.authorTous, Loic
dc.contributor.authorRussell, Richard
dc.contributor.authorHajjiah, Ali
dc.contributor.authorDebucquoy, Maarten
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-22T22:09:59Z
dc.date.available2021-10-22T22:09:59Z
dc.date.issued2015
dc.identifier.issn8750-1473
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25807
dc.sourceIIOimport
dc.titleThe use of silicon epitaxy in advanced n-type PERT and IBC silicon solar cell designs
dc.typeJournal article
dc.contributor.imecauthorRecaman Payo, Maria
dc.contributor.imecauthorKuzma Filipek, Izabela
dc.contributor.imecauthorDuerinckx, Filip
dc.contributor.imecauthorLi, Yuandong
dc.contributor.imecauthorCornagliotti, Emanuele
dc.contributor.imecauthorTous, Loic
dc.contributor.imecauthorDebucquoy, Maarten
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecDuerinckx, Filip::0000-0003-2570-7371
dc.contributor.orcidimecTous, Loic::0000-0001-9928-7774
dc.contributor.orcidimecDebucquoy, Maarten::0000-0001-5980-188X
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.beginpage33
dc.source.journalPhotovoltaics International. The Technology Resource for PV Professionals
dc.source.issue28
dc.identifier.urlhttp://www.pv-tech.org/technical-papers/the-use-of-silicon-epitaxy-in-advanced-n-type-pert-and-ibc-silicon-solar-ce
imec.availabilityPublished - imec


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