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Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)

dc.contributor.authorRezvanov, A.
dc.contributor.authorGutshin, O.
dc.contributor.authorGornev, E.
dc.contributor.authorKrasnikov, G.
dc.contributor.authorMogil'nikov, K.
dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDussarat, C.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T22:13:23Z
dc.date.available2021-10-22T22:13:23Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25815
dc.sourceIIOimport
dc.titleAdsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
dc.typeJournal article
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.source.peerreviewyes
dc.source.beginpage49
dc.source.journalElectronic Engineering
dc.source.volume3
imec.availabilityPublished - imec


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