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dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorArnauts, Sophia
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-23T00:00:50Z
dc.date.available2021-10-23T00:00:50Z
dc.date.issued2015
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26052
dc.sourceIIOimport
dc.title(Sub)nanometer scale etching, oxide removal and reoxidation for InAs (100)
dc.typeJournal article
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpageN5061
dc.source.endpageN5066
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue6
dc.source.volume4
dc.identifier.urlhttp://jss.ecsdl.org/content/4/6/N5061.full
imec.availabilityPublished - imec


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