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Towards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric

dc.contributor.authorWu, Chen
dc.contributor.authorLi, Yunlong
dc.contributor.authorCiofi, Ivan
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-23T01:06:59Z
dc.date.available2021-10-23T01:06:59Z
dc.date.issued2015
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26188
dc.sourceIIOimport
dc.titleTowards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric
dc.typeJournal article
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewyes
dc.source.beginpage64101
dc.source.journalJournal of Applied Physics
dc.source.issue6
dc.source.volume117
dc.identifier.urlhttp://dx.doi.org/10.1063/1.4907686
imec.availabilityPublished - imec


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