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Damage free integration of ultralow-k dielectrics by template replacement approach

dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorHeylen, Nancy
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T01:33:30Z
dc.date.available2021-10-23T01:33:30Z
dc.date.issued2015
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26239
dc.sourceIIOimport
dc.titleDamage free integration of ultralow-k dielectrics by template replacement approach
dc.typeJournal article
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage92901
dc.source.journalApplied Physics Letters
dc.source.issue2
dc.source.volume107
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/107/9/10.1063/1.4930072
imec.availabilityPublished - imec


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