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1/f noise measurements for faster evaluation of electromigration in advanced microelectronics interconnections

dc.contributor.authorBeyne, Sofie
dc.contributor.authorCroes, Kristof
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-23T10:07:09Z
dc.date.available2021-10-23T10:07:09Z
dc.date.issued2016
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26340
dc.sourceIIOimport
dc.title1/f noise measurements for faster evaluation of electromigration in advanced microelectronics interconnections
dc.typeJournal article
dc.contributor.imecauthorBeyne, Sofie
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.source.peerreviewyes
dc.source.beginpage184302
dc.source.journalJournal of Applied Physics
dc.source.issue18
dc.source.volume119
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/jap/119/18/10.1063/1.4947582
imec.availabilityPublished - imec


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