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Fabrication and characterization of ternary Cu8SiS6 and Cu8SiSe6 thin film layers for optoelectronic applications

dc.contributor.authorBrammertz, Guy
dc.contributor.authorVermang, Bart
dc.contributor.authorElAnzeery, Hossam
dc.contributor.authorSahayaraj, Sylvester
dc.contributor.authorRanjbarrizi, Samaneh
dc.contributor.authorMeuris, Marc
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-23T10:10:22Z
dc.date.available2021-10-23T10:10:22Z
dc.date.issued2016
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26379
dc.sourceIIOimport
dc.titleFabrication and characterization of ternary Cu8SiS6 and Cu8SiSe6 thin film layers for optoelectronic applications
dc.typeJournal article
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage649
dc.source.endpage654
dc.source.journalThin Solid Films
dc.source.volume616
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0040609016305739
imec.availabilityPublished - imec


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