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Multimode resistive switching in nanoscale hafnium oxide stack as studied by atomic force microscopy

dc.contributor.authorHou, Yi
dc.contributor.authorCelano, Umberto
dc.contributor.authorGoux, Ludovic
dc.contributor.authorLiu, L.
dc.contributor.authorDegraeve, Robin
dc.contributor.authorCheng, Y.
dc.contributor.authorKang, J.
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-23T11:20:15Z
dc.date.available2021-10-23T11:20:15Z
dc.date.issued2016
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26739
dc.sourceIIOimport
dc.titleMultimode resistive switching in nanoscale hafnium oxide stack as studied by atomic force microscopy
dc.typeJournal article
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage23508
dc.source.journalApplied Physics Letters
dc.source.issue2
dc.source.volume109
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/109/2/10.1063/1.4954258
imec.availabilityPublished - open access


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