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Structural change in porous silica thin film after plasma treatment

dc.contributor.authorKondoh, Eiichi
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBender, Hugo
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T12:22:15Z
dc.date.available2021-09-30T12:22:15Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2674
dc.sourceIIOimport
dc.titleStructural change in porous silica thin film after plasma treatment
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage224
dc.source.endpage226
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue5
dc.source.volume1
imec.availabilityPublished - open access


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