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III/V nano ridge structures for optical applications on patterned 300mm silicon substrate

dc.contributor.authorKunert, Bernardette
dc.contributor.authorGuo, Weiming
dc.contributor.authorMols, Yves
dc.contributor.authorTian, Bin
dc.contributor.authorWang, Zhechao
dc.contributor.authorShi, Yuting
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorLanger, Robert
dc.contributor.authorBarla, Kathy
dc.date.accessioned2021-10-23T11:58:13Z
dc.date.available2021-10-23T11:58:13Z
dc.date.issued2016
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26862
dc.sourceIIOimport
dc.titleIII/V nano ridge structures for optical applications on patterned 300mm silicon substrate
dc.typeJournal article
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorMols, Yves
dc.contributor.imecauthorShi, Yuting
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage91101
dc.source.journalApplied Physics Letters
dc.source.issue9
dc.source.volume109
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/109/9/10.1063/1.4961936
imec.availabilityPublished - open access


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