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Study of Process Technology and Device Architecture for Amorphous Indium Gallium Zinc Oxide Thin Film Transistors

dc.contributor.authorNag, Manoj
dc.date.accessioned2021-10-23T13:11:24Z
dc.date.available2021-10-23T13:11:24Z
dc.date.issued2016-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27066
dc.sourceIIOimport
dc.titleStudy of Process Technology and Device Architecture for Amorphous Indium Gallium Zinc Oxide Thin Film Transistors
dc.typePHD thesis
dc.contributor.imecauthorNag, Manoj
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.contributor.thesisadvisorHeremans, Paul
dc.contributor.thesisadvisorGroeseneken, Guido
dc.identifier.urlhttps://limo.libis.be/primo-explore/fulldisplay?docid=LIRIAS1733148&context=L&vid=Lirias&search_scope=Lirias&tab=default_tab&lang=en_US&fromSitemap=1
imec.availabilityPublished - open access


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