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Photo-responsive oligo(dimethylsiloxane) liquid crystals for defect-free nano-patterning at the sub-5 nm scale

dc.contributor.authorNickmans, K.
dc.contributor.authorMurphy, J.
dc.contributor.authorDe Waal, B.
dc.contributor.authorLeclere, P.
dc.contributor.authorSanchez Somolinos, C.
dc.contributor.authorDoise, Jan
dc.contributor.authorGronheid, Roel
dc.contributor.authorBroer, D.
dc.contributor.authorSchenning, A.
dc.date.accessioned2021-10-23T13:15:31Z
dc.date.available2021-10-23T13:15:31Z
dc.date.issued2016
dc.identifier.issn0935-9648
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27076
dc.sourceIIOimport
dc.titlePhoto-responsive oligo(dimethylsiloxane) liquid crystals for defect-free nano-patterning at the sub-5 nm scale
dc.typeJournal article
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage10068
dc.source.endpage10072
dc.source.journalAdvanced Materials
dc.source.issue45
dc.source.volume28
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/adma.201602891/full
imec.availabilityPublished - open access


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