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Low-frequency noise assessment of different Ge pFinFET STI processes

dc.contributor.authorOliveira, Alberto
dc.contributor.authorSimoen, Eddy
dc.contributor.authorMitard, Jerome
dc.contributor.authorAgopian, Gaula G.D.
dc.contributor.authorMartino, Joao Antonio
dc.contributor.authorLanger, Robert
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-23T13:22:56Z
dc.date.available2021-10-23T13:22:56Z
dc.date.issued2016
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27095
dc.sourceIIOimport
dc.titleLow-frequency noise assessment of different Ge pFinFET STI processes
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.beginpage4031
dc.source.endpage4037
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue10
dc.source.volume63
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7546857
imec.availabilityPublished - imec


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