Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes
dc.contributor.author | Palov, A | |
dc.contributor.author | Mankelevich, Y | |
dc.contributor.author | Rakhimova, T | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-23T13:29:51Z | |
dc.date.available | 2021-10-23T13:29:51Z | |
dc.date.issued | 2016 | |
dc.identifier.issn | 0022-3727 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27112 | |
dc.source | IIOimport | |
dc.title | Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes | |
dc.type | Journal article | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 105203 | |
dc.source.journal | Journal of Physics D: Applied Physics | |
dc.source.issue | 10 | |
dc.source.volume | 49 | |
imec.availability | Published - open access |