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Effect of implantation oxide on the Ti- and Co-silicidation of narrow diffusion and poly-lines

dc.contributor.authorLauwers, Anne
dc.contributor.authorNaem, Abdalla
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T12:31:57Z
dc.date.available2021-09-30T12:31:57Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2711
dc.sourceIIOimport
dc.titleEffect of implantation oxide on the Ti- and Co-silicidation of narrow diffusion and poly-lines
dc.typeJournal article
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage122
dc.source.endpage127
dc.source.journalThin Solid Films
dc.source.volume320
imec.availabilityPublished - open access


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