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UV cure of oxycarbosilane low-k films

dc.contributor.authorRedzheb, Murad
dc.contributor.authorPrager, Lutz
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorArmini, Silvia
dc.contributor.authorVanstreels, Kris
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVan der Voort, Pascal
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T14:07:18Z
dc.date.available2021-10-23T14:07:18Z
dc.date.issued2016
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27202
dc.sourceIIOimport
dc.titleUV cure of oxycarbosilane low-k films
dc.typeJournal article
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.source.peerreviewyes
dc.source.beginpage103
dc.source.endpage107
dc.source.journalMicroelectronic Engineering
dc.source.volume156
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931716300442
imec.availabilityPublished - imec


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