Show simple item record

DI water purity concerns for post-clean rinsing

dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-01T08:29:12Z
dc.date.available2021-10-01T08:29:12Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2739
dc.sourceIIOimport
dc.titleDI water purity concerns for post-clean rinsing
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage432
dc.source.endpage435
dc.source.conference7th International Symposium on Semiconductor Manufacturing
dc.source.conferencedate7/10/1998
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
27611.pdf
Size:
193.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record