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Disordered nanostructures by hole-mask colloidal lithography for advanced light trapping in silicon solar cells

dc.contributor.authorTrompoukis, Christos
dc.contributor.authorMassiot, Ines
dc.contributor.authorDepauw, Valerie
dc.contributor.authorEl Daif, Ounsi
dc.contributor.authorLee, Kidong
dc.contributor.authorDmitriev, Alexandre
dc.contributor.authorGordon, Ivan
dc.contributor.authorMertens, Robert
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-23T15:39:42Z
dc.date.available2021-10-23T15:39:42Z
dc.date.issued2016
dc.identifier.issn1094-4087
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27405
dc.sourceIIOimport
dc.titleDisordered nanostructures by hole-mask colloidal lithography for advanced light trapping in silicon solar cells
dc.typeJournal article
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorMertens, Robert
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpageA191
dc.source.endpageA201
dc.source.journalOptics Express
dc.source.issue2
dc.source.volume24
dc.identifier.urlhttps://www.osapublishing.org/oe/abstract.cfm?uri=oe-24-2-a191
imec.availabilityPublished - imec


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