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Systematic study of interfacial reactions induced by metal electrodes in high-k/InGaAs gate stacks

dc.contributor.authorYoshida, Shinichi
dc.contributor.authorLin, Dennis
dc.contributor.authorVais, Abhitosh
dc.contributor.authorAlian, AliReza
dc.contributor.authorFranco, Jacopo
dc.contributor.authorEl Kazzi, Salim
dc.contributor.authorMols, Yves
dc.contributor.authorMiyanami, Yuki
dc.contributor.authorNakazawa, Masashi
dc.contributor.authorCollaert, Nadine
dc.contributor.authorWatanabe, H
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T17:35:46Z
dc.date.available2021-10-23T17:35:46Z
dc.date.issued2016
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27636
dc.sourceIIOimport
dc.titleSystematic study of interfacial reactions induced by metal electrodes in high-k/InGaAs gate stacks
dc.typeJournal article
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorVais, Abhitosh
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorMols, Yves
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecVais, Abhitosh::0000-0002-0317-7720
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage172101
dc.source.journalApplied Physics Letters
dc.source.issue17
dc.source.volume109
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/109/17/10.1063/1.4965854
imec.availabilityPublished - open access


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