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Oxidation and roughening of silicon during annealing in a rapid thermal processing chamber

dc.contributor.authorMohadjeri, Babak
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-01T08:30:51Z
dc.date.available2021-10-01T08:30:51Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2773
dc.sourceIIOimport
dc.titleOxidation and roughening of silicon during annealing in a rapid thermal processing chamber
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3614
dc.source.endpage3619
dc.source.journalJournal of Applied Physics
dc.source.issue7
dc.source.volume83
imec.availabilityPublished - open access


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