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Stochastic effects in EUV lithography: random, local CD-variability and printing failures

dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-24T03:44:38Z
dc.date.available2021-10-24T03:44:38Z
dc.date.issued2017
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28107
dc.sourceIIOimport
dc.titleStochastic effects in EUV lithography: random, local CD-variability and printing failures
dc.typeJournal article
dc.contributor.imecauthorDe Bisschop, Peter
dc.identifier.doi10.1117/1.JMM.16.4.041013
dc.source.peerreviewyes
dc.source.beginpage41013
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume16
imec.availabilityPublished - imec


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