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Photoresists in extreme ultraviolet lithography

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVesters, Yannick
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-24T03:56:39Z
dc.date.available2021-10-24T03:56:39Z
dc.date.issued2017
dc.identifier.issn2192-8584
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28160
dc.sourceIIOimport
dc.titlePhotoresists in extreme ultraviolet lithography
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage163
dc.source.journalAdvanced Optical Technologies
dc.source.issue3_4
dc.source.volume6
dc.identifier.urlhttps://www.degruyter.com/view/j/aot.2017.6.issue-3-4/aot-2017-0021/aot-2017-0021.xml?format=INT
imec.availabilityPublished - imec


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