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MILP-based optimization of 2-D block masks for timing-aware dummy segment removal in self-aligned multiple patterning layouts

dc.contributor.authorDebacker, Peter
dc.contributor.authorHan, Kwangsoo
dc.contributor.authorKahng, Andrew B.
dc.contributor.authorLee, Hyein
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorWang, Lutong
dc.date.accessioned2021-10-24T04:02:25Z
dc.date.available2021-10-24T04:02:25Z
dc.date.issued2017
dc.identifier.issn0278-0070
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28184
dc.sourceIIOimport
dc.titleMILP-based optimization of 2-D block masks for timing-aware dummy segment removal in self-aligned multiple patterning layouts
dc.typeJournal article
dc.contributor.imecauthorDebacker, Peter
dc.contributor.orcidimecDebacker, Peter::0000-0003-3825-5554
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1075
dc.source.endpage1088
dc.source.journalIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
dc.source.issue7
dc.source.volume36
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7883867/
imec.availabilityPublished - open access


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