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Viapatterning in the 7nm node using immersion lithography and graphoepitaxy directed self-assembly

dc.contributor.authorDoise, Jan
dc.contributor.authorBekaert, Joost
dc.contributor.authorChan, BT
dc.contributor.authorHori, Masafumi
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-24T04:23:11Z
dc.date.available2021-10-24T04:23:11Z
dc.date.issued2017
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28264
dc.sourceIIOimport
dc.titleViapatterning in the 7nm node using immersion lithography and graphoepitaxy directed self-assembly
dc.typeJournal article
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.beginpage23506
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue2
dc.source.volume16
dc.identifier.urlhttp://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2633100
imec.availabilityPublished - imec


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