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Aqueous chemical solution deposition of ultra high-k LuFeO3 thin films

dc.contributor.authorGielis, Sven
dc.contributor.authorIvanov, Maksim
dc.contributor.authorPeys, Nick
dc.contributor.authorVan den Ham, Jonathan
dc.contributor.authorPavlovic, Nikolina
dc.contributor.authorBarrys, Juras
dc.contributor.authorHardy, An
dc.contributor.authorVan Bael, Marlies
dc.date.accessioned2021-10-24T05:04:27Z
dc.date.available2021-10-24T05:04:27Z
dc.date.issued2017
dc.identifier.issn0955-2219
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28397
dc.sourceIIOimport
dc.titleAqueous chemical solution deposition of ultra high-k LuFeO3 thin films
dc.typeJournal article
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage611
dc.source.endpage617
dc.source.journalJournal of the European Ceramic Society
dc.source.issue2
dc.source.volume37
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0955221916304782
imec.availabilityPublished - open access


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