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dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJaenen, Patrick
dc.contributor.authorZhang, Fenghong
dc.contributor.authorDelvaux, Christie
dc.contributor.authorVan Puyenbroeck, Ilse
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-01T08:37:55Z
dc.date.available2021-10-01T08:37:55Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2841
dc.sourceIIOimport
dc.titleHow to use DUV BARCs on topography
dc.typeJournal article
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.source.peerreviewno
dc.source.beginpage13
dc.source.journalMicrolithography World
dc.source.issueSummer Issue
imec.availabilityPublished - imec


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