dc.contributor.author | Op de Beeck, Maaike | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Jaenen, Patrick | |
dc.contributor.author | Zhang, Fenghong | |
dc.contributor.author | Delvaux, Christie | |
dc.contributor.author | Van Puyenbroeck, Ilse | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-01T08:37:55Z | |
dc.date.available | 2021-10-01T08:37:55Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2841 | |
dc.source | IIOimport | |
dc.title | How to use DUV BARCs on topography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Op de Beeck, Maaike | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Jaenen, Patrick | |
dc.contributor.imecauthor | Delvaux, Christie | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Op de Beeck, Maaike::0000-0002-2700-6432 | |
dc.source.peerreview | no | |
dc.source.beginpage | 13 | |
dc.source.journal | Microlithography World | |
dc.source.issue | Summer Issue | |
imec.availability | Published - imec | |