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Investigation of Cl2 etch in view of extremely low temperature selective epitaxial processes

dc.contributor.authorHikavyy, Andriy
dc.contributor.authorKruv, Anastaiia
dc.contributor.authorVan Opstal, Tinneke
dc.contributor.authorDe Vos, Brecht
dc.contributor.authorPorret, Clément
dc.contributor.authorLoo, Roger
dc.date.accessioned2021-10-24T05:46:01Z
dc.date.available2021-10-24T05:46:01Z
dc.date.issued2017
dc.identifier.issn0268-1242
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28512
dc.sourceIIOimport
dc.titleInvestigation of Cl2 etch in view of extremely low temperature selective epitaxial processes
dc.typeJournal article
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVan Opstal, Tinneke
dc.contributor.imecauthorDe Vos, Brecht
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage114006
dc.source.journalSemiconductor Science and Technology
dc.source.issue11
dc.source.volume32
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/1361-6641/aa7e4b/pdf
imec.availabilityPublished - open access


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