dc.contributor.author | Hornsveld, Norah | |
dc.contributor.author | Put, Brecht | |
dc.contributor.author | Kessels, Erwin | |
dc.contributor.author | Vereecken, Philippe | |
dc.contributor.author | Creatore, Mariadriana | |
dc.date.accessioned | 2021-10-24T05:51:10Z | |
dc.date.available | 2021-10-24T05:51:10Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 2046-2069 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28525 | |
dc.source | IIOimport | |
dc.title | Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3 | |
dc.type | Journal article | |
dc.contributor.imecauthor | Put, Brecht | |
dc.contributor.imecauthor | Vereecken, Philippe | |
dc.contributor.orcidimec | Vereecken, Philippe::0000-0003-4115-0075 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 41359 | |
dc.source.endpage | 41368 | |
dc.source.journal | RSC Advances | |
dc.source.issue | 66 | |
dc.source.volume | 7 | |
dc.identifier.url | http://pubs.rsc.org/en/content/articlelanding/2017/ra/c7ra07722j#!divAbstract | |
imec.availability | Published - imec | |