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EUV mask defectivity – A process of increasing control towards HVM

dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-24T06:24:04Z
dc.date.available2021-10-24T06:24:04Z
dc.date.issued2017
dc.identifier.issn2192-8584
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28608
dc.sourceIIOimport
dc.titleEUV mask defectivity – A process of increasing control towards HVM
dc.typeJournal article
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage203
dc.source.endpage220
dc.source.journalAdvanced Optical Technologies
dc.source.issue3_4
dc.source.volume6
dc.identifier.urlhttps://www.degruyter.com/view/j/aot.2017.6.issue-3-4/aot-2017-0017/aot-2017-0017.xml
imec.availabilityPublished - imec


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