Optically induced mask criical dimension error magnification in 248 nm lithography
| dc.contributor.author | Randall, John | |
| dc.contributor.author | Tritchkov, Alexander | |
| dc.date.accessioned | 2021-10-01T08:45:50Z | |
| dc.date.available | 2021-10-01T08:45:50Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2894 | |
| dc.source | IIOimport | |
| dc.title | Optically induced mask criical dimension error magnification in 248 nm lithography | |
| dc.type | Journal article | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 3606 | |
| dc.source.endpage | 3611 | |
| dc.source.journal | Journal of Vacuum Science and Technology B | |
| dc.source.issue | 6 | |
| dc.source.volume | 12 | |
| imec.availability | Published - open access |