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Reduction of mask induced CD errors by optical proximity correction

dc.contributor.authorRandall, John
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorJonckheere, Rik
dc.contributor.authorJaenen, Patrick
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-01T08:46:01Z
dc.date.available2021-10-01T08:46:01Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2895
dc.sourceIIOimport
dc.titleReduction of mask induced CD errors by optical proximity correction
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage124
dc.source.endpage130
dc.source.conferenceOptical Microlithography XI
dc.source.conferencedate25/02/1998
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3334


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