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Nucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces

dc.contributor.authorPhilipsen, Harold
dc.contributor.authorJehoul, Hannes
dc.contributor.authorInoue, Fumihiro
dc.contributor.authorVandersmissen, Kevin
dc.contributor.authorYang, Liu
dc.contributor.authorStruyf, Herbert
dc.contributor.authorvan Dorp, Dennis
dc.date.accessioned2021-10-24T10:57:16Z
dc.date.available2021-10-24T10:57:16Z
dc.date.issued2017
dc.identifier.issn0013-4686
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29169
dc.sourceIIOimport
dc.titleNucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorJehoul, Hannes
dc.contributor.imecauthorInoue, Fumihiro
dc.contributor.imecauthorVandersmissen, Kevin
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.source.peerreviewyes
dc.source.beginpage407
dc.source.endpage417
dc.source.journalElectrochimica Acta
dc.source.volume230
dc.identifier.urlhttp://dx.doi.org/10.1016/j.electacta.2017.02.010
imec.availabilityPublished - imec


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