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Epitaxial Si lift-off technology: Current status and challenges

dc.contributor.authorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.authorDepauw, Valerie
dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorGordon, Ivan
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-24T13:42:39Z
dc.date.available2021-10-24T13:42:39Z
dc.date.issued2017
dc.identifier.issn8750-1473
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29452
dc.sourceIIOimport
dc.titleEpitaxial Si lift-off technology: Current status and challenges
dc.typeJournal article
dc.contributor.imecauthorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecSivaramakrishnan Radhakrishnan, Hariharsudan::0000-0003-1963-273X
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.beginpage44
dc.source.endpage56
dc.source.journalPhotovoltaics International. The Technology Resource for PV Professionals
dc.source.volume37
imec.availabilityPublished - imec


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