Improving low-temperature APCVD SiO2 passivation by rapid themal annealing for Si devices
dc.contributor.author | Sivoththaman, Sivanarayanamoorthy | |
dc.contributor.author | De Schepper, Patrick | |
dc.contributor.author | Laureys, Wim | |
dc.contributor.author | Nijs, Johan | |
dc.contributor.author | Mertens, Robert | |
dc.date.accessioned | 2021-10-01T08:57:21Z | |
dc.date.available | 2021-10-01T08:57:21Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2955 | |
dc.source | IIOimport | |
dc.title | Improving low-temperature APCVD SiO2 passivation by rapid themal annealing for Si devices | |
dc.type | Journal article | |
dc.contributor.imecauthor | Mertens, Robert | |
dc.source.peerreview | no | |
dc.source.beginpage | 505 | |
dc.source.endpage | 507 | |
dc.source.journal | IEEE Electron Device Letters | |
dc.source.issue | 12 | |
dc.source.volume | 19 | |
imec.availability | Published - imec |
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