dc.contributor.author | Vesters, Yannick | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-24T18:10:49Z | |
dc.date.available | 2021-10-24T18:10:49Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 0914-9244 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29868 | |
dc.source | IIOimport | |
dc.title | Dissolution rate monitor tool to measure EUV photoresist dissolution | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 675 | |
dc.source.endpage | 681 | |
dc.source.journal | Journal of Photopolymer Science and Technology | |
dc.source.issue | 6 | |
dc.source.volume | 30 | |
imec.availability | Published - imec | |