Now showing items 1-3 of 3

    • Dry etching patterning requirements for multi-gate devices 

      Altamirano Sanchez, Efrain; Vandeweyer, Tom; Demand, Marc; Boullart, Werner (2013-09)
    • FinFETs and their futures 

      Horiguchi, Naoto; Parvais, Bertrand; Chiarella, Thomas; Collaert, Nadine; Veloso, Anabela; Rooyackers, Rita; Verheyen, Peter; Witters, Liesbeth; Redolfi, Augusto; De Keersgieter, An; Brus, Stephan; Zschaetzsch, Gerd; Ercken, Monique; Altamirano Sanchez, Efrain; Locorotondo, Sabrina; Demand, Marc; Jurczak, Gosia; Vandervorst, Wilfried; Hoffmann, Thomas Y.; Biesemans, Serge (2011)
    • Low-voltage scaled 6T FinFET SRAM cells 

      Collaert, Nadine; von Arnim, Klaus; Rooyackers, Rita; Vandeweyer, Tom; Mercha, Abdelkarim; Parvais, Bertrand; Witters, Liesbeth; Nackaerts, Axel; Altamirano Sanchez, Efrain; Demand, Marc; Hikavyy, Andriy; Demuynck, Steven; Devriendt, Katia; Bauer, F.; Ferain, Isabelle; Veloso, Anabela; De Meyer, Kristin; Biesemans, Serge; Jurczak, Gosia (2010-08)