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Proximity effects correction for advanced optical lithography processes

dc.contributor.authorTritchkov, Alexander
dc.contributor.authorFinders, Jo
dc.contributor.authorRandall, John
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-10-01T09:07:32Z
dc.date.available2021-10-01T09:07:32Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3002
dc.sourceIIOimport
dc.titleProximity effects correction for advanced optical lithography processes
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.source.peerreviewno
dc.source.beginpage3585
dc.source.endpage3593
dc.source.journalJapanese Journal of Applied Physics. Part 1: Regular Papers
dc.source.issue6A
dc.source.volume37
imec.availabilityPublished - imec


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