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Selective Ru ALD as a catalyst for sub 7nm bottom-up metal interconnects

dc.contributor.authorZyulkov, Ivan
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-24T20:18:16Z
dc.date.available2021-10-24T20:18:16Z
dc.date.issued2017
dc.identifier.issn1944-8244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30046
dc.sourceIIOimport
dc.titleSelective Ru ALD as a catalyst for sub 7nm bottom-up metal interconnects
dc.typeJournal article
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage31031
dc.source.endpage31041
dc.source.journalACS Applied Materials & Interfaces
dc.source.issue36
dc.source.volume9
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/acsami.7b07811
imec.availabilityPublished - open access


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