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Optical lithography patterning of SoO2 layers for interface passivation of thin film solar cells

dc.contributor.authorBose, Sourav
dc.contributor.authorCunha, José M.V.
dc.contributor.authorSuresh, Sunil
dc.contributor.authorde Wild, Jessica
dc.contributor.authorLopes, Tomas S.
dc.contributor.authorBarbosa, Joao R.S.
dc.contributor.authorSilva, Ricardo
dc.contributor.authorBorme, Jérôme
dc.contributor.authorFernandes, Paulo A.
dc.contributor.authorVermang, Bart
dc.contributor.authorSalomé, Pedro M.P.
dc.date.accessioned2021-10-25T16:53:16Z
dc.date.available2021-10-25T16:53:16Z
dc.date.issued2018
dc.identifier.issn2367-198X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30307
dc.sourceIIOimport
dc.titleOptical lithography patterning of SoO2 layers for interface passivation of thin film solar cells
dc.typeJournal article
dc.contributor.imecauthorde Wild, Jessica
dc.contributor.imecauthorVermang, Bart
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.date.embargo9999-12-31
dc.identifier.doi10.1002/solr.201800212
dc.source.peerreviewyes
dc.source.beginpage1800212
dc.source.journalSolar RRL
dc.source.issue12
dc.source.volume2
dc.identifier.urlhttps://onlinelibrary.wiley.com/doi/abs/10.1002/solr.201800212
imec.availabilityPublished - open access


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