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Sub-100 nm2 cobalt interconnects

dc.contributor.authorDutta, Shibesh
dc.contributor.authorBeyne, Sofie
dc.contributor.authorGupta, Anshul
dc.contributor.authorKundu, Shreya
dc.contributor.authorBender, Hugo
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorJamieson, Geraldine
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-25T18:22:36Z
dc.date.available2021-10-25T18:22:36Z
dc.date.issued2018
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30659
dc.sourceIIOimport
dc.titleSub-100 nm2 cobalt interconnects
dc.typeJournal article
dc.contributor.imecauthorBeyne, Sofie
dc.contributor.imecauthorGupta, Anshul
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorJamieson, Geraldine
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecJamieson, Geraldine::0000-0002-6750-097X
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage731
dc.source.endpage734
dc.source.journalIEEE Electron Device Letters
dc.source.issue5
dc.source.volume39
dc.identifier.urlhttps://doi.org/10.1109/LED.2018.2821923
imec.availabilityPublished - imec


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