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Defect-induced stress imaging in single and multi-crystalline semiconductor materials

dc.contributor.authorHerms, Martin
dc.contributor.authorWagner, Matthias
dc.contributor.authorKayser, Stefan
dc.contributor.authorKießling, Frank
dc.contributor.authorPoklad, Anna
dc.contributor.authorZhao, Ming
dc.contributor.authorKretzer, Ulrich
dc.date.accessioned2021-10-25T19:44:27Z
dc.date.available2021-10-25T19:44:27Z
dc.date.issued2018
dc.identifier.issn1369-7021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30878
dc.sourceIIOimport
dc.titleDefect-induced stress imaging in single and multi-crystalline semiconductor materials
dc.typeJournal article
dc.contributor.imecauthorZhao, Ming
dc.contributor.orcidimecZhao, Ming::0000-0002-0856-851X
dc.source.peerreviewyes
dc.source.beginpage14748
dc.source.endpage14756
dc.source.journalMaterials Today
dc.source.issue6
dc.source.volume5
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S2214785318306539
imec.availabilityPublished - imec


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