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Factor analysis of plasma-induced damage in bulk FinFET technology

dc.contributor.authorHiblot, Gaspard
dc.contributor.authorVan der Plas, Geert
dc.date.accessioned2021-10-25T19:50:32Z
dc.date.available2021-10-25T19:50:32Z
dc.date.issued2018
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30893
dc.sourceIIOimport
dc.titleFactor analysis of plasma-induced damage in bulk FinFET technology
dc.typeJournal article
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.source.peerreviewyes
dc.source.beginpage927
dc.source.endpage930
dc.source.journalIEEE Electron Device Letters
dc.source.issue7
dc.source.volume39
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8360171/
imec.availabilityPublished - imec


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