Show simple item record

Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications

dc.contributor.authorVertommen, Johan
dc.contributor.authorKlippert, W.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.date.accessioned2021-10-01T09:40:29Z
dc.date.available2021-10-01T09:40:29Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3129
dc.sourceIIOimport
dc.titleIntegrated silylation and dry development of resist for sub-0.15µm top surface imaging applications
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.source.peerreviewno
dc.source.beginpage597
dc.source.endpage612
dc.source.journalJ. Photopolymer Science and Technology
dc.source.issue4
dc.source.volume11
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record