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Extending optical lithography to 0.1 µm ?

dc.contributor.authorWauters, Jan
dc.date.accessioned2021-10-01T09:46:17Z
dc.date.available2021-10-01T09:46:17Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3149
dc.sourceIIOimport
dc.titleExtending optical lithography to 0.1 µm ?
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage175
dc.source.endpage180
dc.source.journalSemiconductor Fabtech
dc.source.volume8
imec.availabilityPublished - imec


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