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Immersion and electrochemical deposition of Ru on Si

dc.contributor.authorPhilipsen, Harold
dc.contributor.authorMonnens, Wouter
dc.date.accessioned2021-10-26T01:10:17Z
dc.date.available2021-10-26T01:10:17Z
dc.date.issued2018
dc.identifier.issn0013-4686
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31524
dc.sourceIIOimport
dc.titleImmersion and electrochemical deposition of Ru on Si
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.source.peerreviewyes
dc.source.beginpage306
dc.source.endpage315
dc.source.journalElectrochimica Acta
dc.source.volume274C
dc.identifier.urlhttps://doi.org/10.1016/j.electacta.2018.04.093
imec.availabilityPublished - imec


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