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Multi trigger resist for EUV lithography

dc.contributor.authorPopescu, Carmen
dc.contributor.authorVesters, Yannick
dc.contributor.authorMcClelland, Alexandra
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDawson, Guy
dc.contributor.authorRoth, John
dc.contributor.authorTheis, Wolfgang
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRobinson, Alex
dc.date.accessioned2021-10-26T01:26:48Z
dc.date.available2021-10-26T01:26:48Z
dc.date.issued2018
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31552
dc.sourceIIOimport
dc.titleMulti trigger resist for EUV lithography
dc.typeJournal article
dc.contributor.imecauthorPopescu, Carmen
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage227
dc.source.endpage232
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue2
dc.source.volume31
dc.identifier.urlhttps://doi.org/10.2494/photopolymer.31.227
imec.availabilityPublished - open access


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