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Tuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants

dc.contributor.authorRedzheb, Murad
dc.contributor.authorOkudur, Oguzhan Orkut
dc.contributor.authorBernstorff, Sigrid
dc.contributor.authorJuraic, Krunoslav
dc.contributor.authorVan der Voort, Pascal
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-26T02:26:02Z
dc.date.available2021-10-26T02:26:02Z
dc.date.issued2018
dc.identifier.issn1439-4235
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31646
dc.sourceIIOimport
dc.titleTuning the properties of periodic mesoporous organosilica films for low-k application by Gemini surfactants
dc.typeJournal article
dc.contributor.imecauthorOkudur, Oguzhan Orkut
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecOkudur, Oguzhan Orkut::0000-0002-4790-7772
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.beginpage2295
dc.source.endpage2298
dc.source.journalChemPhysChem
dc.source.issue18
dc.source.volume19
dc.identifier.urlhttps://onlinelibrary.wiley.com/doi/abs/10.1002/cphc.201800341
imec.availabilityPublished - imec


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