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Evaluation of novel carrier substrates for high reliability and integrated GaN devices in a 200 mm complementary metal-oxide semiconductor compatible process

dc.contributor.authorStoffels, Steve
dc.contributor.authorGeens, Karen
dc.contributor.authorLi, Xiangdong
dc.contributor.authorWellekens, Dirk
dc.contributor.authorYou, Shuzhen
dc.contributor.authorZhao, Ming
dc.contributor.authorBorga, Matteo
dc.contributor.authorZanoni, Enrico
dc.contributor.authorMeneghesso, Gaudenzio
dc.contributor.authorMeneghini, Matteo
dc.contributor.authorPosthuma, Niels
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorDecoutere, Stefaan
dc.date.accessioned2021-10-26T04:44:50Z
dc.date.available2021-10-26T04:44:50Z
dc.date.issued2018
dc.identifier.issn2159-6859
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31861
dc.sourceIIOimport
dc.titleEvaluation of novel carrier substrates for high reliability and integrated GaN devices in a 200 mm complementary metal-oxide semiconductor compatible process
dc.typeJournal article
dc.contributor.imecauthorStoffels, Steve
dc.contributor.imecauthorGeens, Karen
dc.contributor.imecauthorLi, Xiangdong
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorYou, Shuzhen
dc.contributor.imecauthorZhao, Ming
dc.contributor.imecauthorBorga, Matteo
dc.contributor.imecauthorPosthuma, Niels
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecGeens, Karen::0000-0003-1815-3972
dc.contributor.orcidimecZhao, Ming::0000-0002-0856-851X
dc.contributor.orcidimecBorga, Matteo::0000-0003-3087-6612
dc.contributor.orcidimecPosthuma, Niels::0000-0002-6029-1909
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.source.peerreviewyes
dc.source.beginpage1387
dc.source.endpage1394
dc.source.journalMRS Communications
dc.source.volume84
dc.identifier.urlhttps://doi.org/10.1557/mrc.2018.192
imec.availabilityPublished - imec


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